Copyright Plaspro GmbH 2012
Surface Tension Gradient Dryer (STG)
Substrate Drying with No Watermarks
The Gradient Dryer uses the difference between the surface tension of H2O and IPA
to produce a gradient that generates fast and effective substrate drying. Surface
tension gradient drying yields substrates that are watermark-
Features
- Automatic, high-
volume single or dual cassette configurations - Adaptable for silicon, disk drive and other applications
- Available as stand-
alone unit or integrated into wet benches - Programmable processing recipes
- User-
friendly software with touch screen interface - No exposed metal components
Main Benefits
- No watermarks
- Very low particle counts
- No substrate breakage
- No moving parts
- No feature damage (no spin drying)
- Excellent for high aspect ratio structures
- No charge damage
- Reduces chemical consumption
- Cost savings through improved cycle times & reduced maintenance
- Excellent alternative to spin rinser dryer
IPA concentration gradient induces surface tension gradient drying without watermarks.
Cross section of The Surface Tension Gradient Dryer
