DI Water Heaters

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Deposition & Etch Metrology Wet Process Wafer Process

DI Water Heaters

Designed for the ultra pure demands of the semiconductor industry, Process Technology offers a full line de-ionized water heaters designed for your most demanding applications. Sizes range from 3,000 watts up to 260,000 watts. The patented designs incorporate unique features for superior thermal response. The heaters are available in quartz or fluoropolymer wetted parts for the most demanding high purity applications. All high purity heaters are assembled in an ISO5 (Class 100) cleanroom. Also available are heaters made from titanium wetted parts for less critical, but still virtually contamination free performance.

UPDI Water Heater

Tytan Water Heater

Quartz H2OT SHOT

Proven technology for UPDI heating applications. Patented purged element design offers exceptional MTBF. Conforms to Semi standards and CE compliant. Sizes available up to 260kW. Available patented DACTM software provides accurate temperature control for different flow and temperature requirements.

	Reliable: Our proven heating technology uses high-performance resistance wire, resulting in greatly enhanced service life.

	"Safe Process" Design: Heating element is isolated from the process to virtually eliminate the potential for catastrophic process contamination.

	Minimal Preventative Maintenance: Only minor, infrequent PM is needed

	Low Facility Costs: No auxiliary gas or special ventilation needed; minimal facility requirements.

	Compact Configuration: Space-conscious design minimizes footprint requirements.

	Improved Process Results: Heated DI water improves cleaning effectiveness and reduces rinse time in most processes.

	Cost Saving Design: >99% element efficiency contributes to low cost of ownership (COO) and excellent return on investment (ROI).

	Outstanding Cleanliness: 100% titanium heating elements provide very clean performance for precision cleaning applications.

	Outstanding Temperature Responsiveness and Stability: Excellent temperature accuracy over a wide flow range can substantially improve process consistency.