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Copyright Plaspro GmbH 2012

Deposition & Etch Metrology Wet Process Wafer Process

T-ESC® Technology offers safe and easy handling as well as processing of thin and ultra-thin substrates. The basic concept behind this reversible chucking technology involves using electrostatic force to clamp thin and ultra-thin flexible wafers onto robust carriers (T-ESC®). Such wafer-carrier packages can be handled and processed like wafers of standard thickness. Therefore, existing standard cassettes, handling tools, and fabrication equipment can be used without modifications. Warp and bow of thin and ultra-thin substrates are eliminated.


PCS offers different types of carriers (T-ESC®) applicable to a great variety of process applications.

Consisting of :


Chucking Module CM 3000 as main unit

Thin Wafer S or ter/Handler as framework

Aligner Station with two ID readers, reading from back-  and front side

High precision alignment  < 100µm

Touchless unipolar chucking

Advanced dechucking features

Smooth chucking for ultra-thin substrates

Semi Standard Communication SECS/GEM

Technical Data:
Machine D imensions: L x W x H: 1440 x 1485 x 2092 mm
Weight: 1.000 kg

FULLY AUTOMATED CHUCKING UNIT ACU 3000

Stand-alone semi-automated electrostatic chucking/de-chucking unit

Consists of a Chucking Module CM 3000
Equipped with a stand, a special manual load port, and necessary interfaces, e.g. to access a host system

Technical Data
Machine Dimensions  L x W x H: 650 x 700 x 1100 mm
Weight  30 kg

STAND-ALONE CHUCKING UNIT SCU 3000

TRANSFER ELECTROSTATIC CARRIER (T-ESC®)


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